发明名称 |
Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions |
摘要 |
Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products from the effluent. An endpoint detector such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.
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申请公布号 |
US2003056726(A1) |
申请公布日期 |
2003.03.27 |
申请号 |
US20020278276 |
申请日期 |
2002.10.23 |
申请人 |
HOLST MARK;FALLER REBECCA;TOM GLENN;ARNO JOSE;DUBOIS RAY |
发明人 |
HOLST MARK;FALLER REBECCA;TOM GLENN;ARNO JOSE;DUBOIS RAY |
分类号 |
B01D53/72;B01D53/04;B01D53/34;B01D53/64;B01J20/08;B01J20/10;B01J20/18;B01J20/20;B01J20/26;B01J20/34;C23C16/40;C23C16/44;(IPC1-7):C23C16/00 |
主分类号 |
B01D53/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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