发明名称 SPUTTER RESISTANT SECONDARY EMISSION COATING FOR ELECTRODES
摘要 A plasma cell constituting a display device includes a pair of substrates, bonded to each other with a pre-set gap in-between for defining a hermetically sealed space in-between, an ionizable gas charged into the space and discharge electrodes formed on at least one of the substrates for ionizing the gas for producing electrical discharge in the space. The discharge electrodes are overcoated by a film-shaped substance formed by an electro-deposition method. This substance has resistance against sputtering for protecting the discharge electrodes against impacts by the ionized gas and secondary electron emitting characteristics enabling electrical discharge. The substance is selected from the group of borides, carbides, oxides, nitrides, metals and metalloids., and has sufficient resistance against sputtering to eliminate or suppress the amount of mercury used.
申请公布号 US2003057830(A1) 申请公布日期 2003.03.27
申请号 US19990474900 申请日期 1999.12.30
申请人 KANNO YOSHIHIRO 发明人 KANNO YOSHIHIRO
分类号 H01J9/02;G02F1/133;G02F1/1333;H01J17/04;H01J17/06;H01J17/49;(IPC1-7):H01J17/49 主分类号 H01J9/02
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