发明名称 |
MASK PLATE DESIGN |
摘要 |
The present invention includes a mask plate design that includes at least one or a plurality of channels portions on a surface of the mask plate, into which electrolyte solution will accumulate when the mask plate surface is disposed on a surface of wafer, and out of which the electrolyte solution will freely flow. There are also at least one or a plurality of polish portions on the mask plate surface that allow for polishing of the wafer when the mask plate surface is disposed on a surface of wafer. |
申请公布号 |
WO02077327(B1) |
申请公布日期 |
2003.03.27 |
申请号 |
WO2002US06231 |
申请日期 |
2002.02.27 |
申请人 |
NUTOOL, INC. |
发明人 |
BASOL, BULENT, M.;UZOH, CYPRIAN;BOGART, JEFF, A. |
分类号 |
B24B37/04;C25D5/02;C25D5/08;C25D5/22;C25D7/12;C25F7/00;H01L21/288;H01L21/768;(IPC1-7):C25D5/02;B24D7/10 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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