发明名称 |
VARACTOR WITH IMPROVED G-FACTOR CHARACTERISTIC USING SIGE HETEROJUCNTION BIPOLAR TRANSISTOR AND METHOD FOR FABRICATING THE SAME |
摘要 |
PURPOSE: A varactor and a method for fabricating the same are provided to keep the q-factor characteristic in a good condition by using SiGe hetero junction bipolar transistor whose phase noise characteristic is better than others. CONSTITUTION: A n+ type buried collector region(301) is formed in a p type semiconductor substrate(300). A n type collector and n+ type collector contact region(302,303) are placed apart from each other by a device isolation layer(304). A p+ type external base region(315) is formed on the n type collector contact region. A p+ type SiGe base region(305) is formed on the p+ type external base region. A metal silicide layer(312) is formed on the p+ type SiGe base region(305). The first meal layer(309) formed on the exposed portion of the metal silicide layer is used as an anode electrode. A n+ type poly silicon layer(307) and metal silicide layer(312) are formed on the n+ type collector contact region in a sequence. The second metal layer formed on the exposed part of the metal silicide layer is used as a cathode electrode.
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申请公布号 |
KR20030024155(A) |
申请公布日期 |
2003.03.26 |
申请号 |
KR20010057175 |
申请日期 |
2001.09.17 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KANG, JIN YEONG;MIN, BONG GI;SEO, DONG U |
分类号 |
H01L29/73;H01L21/329;H01L21/331;H01L29/93;(IPC1-7):H01L29/73 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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