LOAD LOCK CHAMBER OF SEMICONDUCTOR FABRICATION EQUIPMENT

摘要

PURPOSE: A load lock chamber of semiconductor fabrication equipment is provided to minimize the contamination of a wafer by preventing the generation of particles on a wafer in a pumping process of a load lock chamber. CONSTITUTION: A load lock chamber(120) is connected with a process chamber(110) through a gate valve(140). A transferring arm(124) is installed at the load lock chamber(120). A blade(124a) is installed at an end portion of the transferring arm(124). A wafer loading and unloading process is performed between the load lock chamber(120) and the outside under atmospheric pressure. The wafer loading and unloading process is performed between the load lock chamber(120) and the process chamber(110) under vacuum state. A vacuum exhaust portion(130) is used for controlling the pressure of the load lock chamber(120). The vacuum exhaust portion(130) is formed with a vacuum port(132), a vacuum line(134), and a vacuum pump(136).