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发明名称
HIGHLY CONFORMAL TITANIUM NITRIDE DEPOSITION PROCESS FOR HIGH ASPECT RATIO STRUCTURES
摘要
申请公布号
EP1295332(A2)
申请公布日期
2003.03.26
申请号
EP20010952348
申请日期
2001.06.29
申请人
INFINEON TECHNOLOGIES NORTH AMERICA CORP.;INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
JAMMY, RAJARAO;FALTERMEIER, CHERYL, G.;SCHROEDER, UWE;WONG, KWONG, HON
分类号
C23C16/04;C23C16/34;H01L21/02;H01L21/285;H01L21/768;H01L21/8242;(IPC1-7):H01L21/768
主分类号
C23C16/04
代理机构
代理人
主权项
地址
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