ELECTRO-CHEMICAL ETCHING APPARATUS

摘要

PURPOSE: An electro-chemical etching apparatus is provided to prevent damage and breakage of the wafer by being supported by an electrode structure during variation of the wafer pressure due to input of etch solution. CONSTITUTION: An electro-chemical etching apparatus comprises a case(30) having the first and second vacuum line(34a,34b), the first packing(36) for sealing openings, a cover(50) for covering the outside portion of a wafer(W) and the second packing(52) for sealing the inside and outside potion of a groove(48).