| 摘要 |
PURPOSE: An electrostatic chuck is provided to improve holding force and cooling efficiency when manufacturing larger than 300mm wafer by using two composite electrostatic chucks. CONSTITUTION: An electrostatic chuck(101) consists of the first one(101a) having an opening in its center and the second one(101b) inserted into the opening of the first one. The two electrostatic chucks have cooling parts(220a,220b), electrodes(180a,180b), bodies(160a,160b) and upper electrostatic chucks(120a,120b), on which groove patterns are formed. The cooling parts(220a) are connected to the inflow line(222a-1,222b-1) and the outflow line(222a-2 2,222b-2) for helium gas.
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