发明名称 Semiconductor memory device, method of manufacturing the same and method of driving the same
摘要 The present invention relates to a dual bit nonvolatile programmable read/write memory containing a semiconductor memory element having one conductivity type semiconductor substrate including at least one convex portion. A pair of opposite conductivity source/drain regions are formed on a surface of the semiconductor substrate an opposing sides of the convex portion, and a first insulating film covers the upper surface of the convex portion. Second insulating films cover the side surfaces of the convex portion and the source/drain regions. A pair of floating gates abut opposing side surfaces of the convex portion and the source/drain regions through the second insulating films. Third insulating films are formed on the floating gates. A control gate covers the upper surface of the convex portion through the first insulating film and the floating gates through the third insulating films.
申请公布号 US6538925(B2) 申请公布日期 2003.03.25
申请号 US20010984190 申请日期 2001.10.29
申请人 INNOTECH CORPORATION 发明人 MIIDA TAKASHI
分类号 H01L21/8247;H01L27/115;(IPC1-7):G11C11/34 主分类号 H01L21/8247
代理机构 代理人
主权项
地址