| 摘要 |
<p>PURPOSE: To provide a gas treatment apparatus capable of treating highly corrosive gas efficiently. CONSTITUTION: In a gas treatment apparatus 1 treating gas G by bringing the same into contact with a liquid, the liquid film forming member 2 immersed in and taken out of the treatment soln. W charged in a liquid tank 2 and floated from the treatment soln. W to form the treatment soln. film on the surface thereof is provided and the gas G passing on the treatment soln. W is brought into contact with the treatment soln. film.</p> |
