发明名称 METHOD FOR MANUFACTURING SUBSTRATE DEVICE AND METHOD FOR MANUFACTURING ELECTRO-OPTICAL EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To effectively prevent the generation of short-circuit between pattern parts constituting a wiring electrode element formed on a substrate. SOLUTION: This method comprises a step for forming a scanning line (3a) on a substrate (10), a process for forming a thin film (401) on this, a process for carrying out processing such as impurity drive-in to the lower layer side of the scanning line or the scanning line on the substrate, a process for removing the thin film after carrying out the drive-in processing, and a process for forming an inter-layer insulating film (41) on the scanning line after the removal processing.</p>
申请公布号 JP2003086812(A) 申请公布日期 2003.03.20
申请号 JP20010277104 申请日期 2001.09.12
申请人 SEIKO EPSON CORP 发明人 YAMAZAKI KOJI
分类号 G02F1/13;G02F1/1368;G09F9/30;H01L21/027;H01L21/28;H01L21/3205;H01L21/336;H01L23/52;H01L29/786;(IPC1-7):H01L29/786;H01L21/320;G02F1/136 主分类号 G02F1/13
代理机构 代理人
主权项
地址