发明名称 |
CVD material compound and method for manufacturing the same and CVD method of ruthenium or ruthenium compound thin film |
摘要 |
The present invention provides a CVD material compound based on an organic ruthenium compound, the organic ruthenium compound consisting of one of cis and trans isomers of tris (2,4-octa-dionato) ruthenium (III). The organic ruthenium compound which consists of cis or trans isomer can be isolated by the steps of preparing tris (2,4-octa-dionato) ruthenium (III) in any method, making the tris (2,4-octa-dionato) ruthenium (III) adsorbed on an adsorbent including alumina, bringing the adsorbent into contact with a first solvent to elute the trans isomer and then bringing the adsorbent into contact with a second solvent having a polarity higher than that of the first solvent to elute the cis isomer.
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申请公布号 |
US2003054638(A1) |
申请公布日期 |
2003.03.20 |
申请号 |
US20020175873 |
申请日期 |
2002.06.21 |
申请人 |
TANAKA KIKINZOKU KOGYO K.K. (JAPANESE CORPORATION) |
发明人 |
SAITO MASAYUKI;TANIUCHI JUNICHI;OKAMOTO KOJI;SUZUKI HIROAKI |
分类号 |
C07C45/79;C07C49/92;C07F15/00;C23C16/18;H01L21/02;H01L21/28;H01L21/285;(IPC1-7):C07F15/00;H01L21/44 |
主分类号 |
C07C45/79 |
代理机构 |
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