发明名称 NITRIDE SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent a dielectric film and an electrode from being exfoliated by improving the adhesion properties in the dielectric film and the electrode that are formed on a nitride semiconductor. SOLUTION: The nitride semiconductor device containing a nitride semiconductor layer, an electrode, and a dielectric film has an InGaNX contact layer containing one or more elements X selected from among As, P, and Sb in contact with an area between the nitride semiconductor layer and the dielectric film, thus preventing the dielectric film from being exfoliated. Additionally, an electrode is formed in contact with the InGaNX contact layer, thus preventing the electrode from being exfoliated.
申请公布号 JP2003086533(A) 申请公布日期 2003.03.20
申请号 JP20010277369 申请日期 2001.09.13
申请人 SHARP CORP 发明人 TSUDA YUZO
分类号 H01L21/28;H01L33/32;H01L33/42;H01L33/44;H01S5/042;H01S5/323;H01S5/343 主分类号 H01L21/28
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