| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner for improving contrast or overlaying precision by reducing the difference in a measurement error amount of a dimensional measurement device and improving synchronization precision between a light-shielding plate, an original stage and a substrate stage. SOLUTION: In synchronous driving, a laser interferometer 18 for the light- shielding plate, a laser interferometer 3 for a reticle stage and a laser interferometer 7 for the wafer stage, each serving as a dimension measuring device are disposed at respective positions where the distances between the stage 2 and the interferometer 3, between the stage 6 and the interferometer 7 increase, when the distance between the plate 16 and the interferometer 18 is increased, and where the distances between the stage 2 and the interferometer 3 between the stage 6 and the interferometer 7 is decreased, when the distance between the plate 16 and the interferometer 18 is decreased.
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