发明名称 Chemical processing using non-thermal discharge plasma
摘要 A method for activating chemical reactions using a non-thermal capillary discharge plasma (NT-CDP) unit or a non-thermal slot discharge plasma (NT-SDP) unit (collectively referred to as "NT-CDP/SDP"). The NT-CDP/SDP unit includes a first electrode disposed between two dielectric layers, wherein the first electrode and dielectric layers having at least one opening (e.g., capillary or a slot) defined therethrough. A dielectric sleeve inserted into the opening, and at least one second electrode (e.g., in the shape of a pin, ring, metal wire, or tapered metal blade) is disposed in fluid communication with an associated opening. A non-thermal plasma discharge is emitted from the opening when a voltage differential is applied between the first and second electrodes. Chemical feedstock to be treated is then exposed to the non-thermal plasma. This processing is suited for the following exemplary chemical reactions as (i) partial oxidation of hydrocarbon feedstock to produce functionalized organic compounds; (ii) chemical stabilization of a polymer fiber (e.g., PAN fiber precursor in carbon fiber production; (iii) pre-reforming of higher chain length petroleum hydrocarbons to generate a feedstock suitable for reforming; (iv) natural gas reforming in a chemically reducing atmosphere (e.g., ammonia or urea) to produce carbon monoxide and Hydrogen gas; or (v) plasma enhanced water gas shifting.
申请公布号 US2003051993(A1) 申请公布日期 2003.03.20
申请号 US20020211980 申请日期 2002.08.02
申请人 PLASMASOL CORPORATION 发明人 RICATTO PASCAL J.;HOUSTON EDWARD J.;CROWE RICHARD
分类号 B01J19/08;C01B3/14;C01B31/18;C10G35/02;C10G35/16;H05H1/24;(IPC1-7):H05F3/00;C01B3/00;B01J8/00;B01D47/00 主分类号 B01J19/08
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