发明名称 VACUUM PROCESSING UNIT, SEMICONDUCTOR PRODUCTION LINE EMPLOYING IT AND VACUUM PROCESSING METHOD OF SAMPLE
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing unit responding to an increasing diameter of a sample while suppressing an increase in production cost without sacrificing maintainability. SOLUTION: The vacuum processing unit comprises a cassette table for mounting a cassette containing a sample, a first sample carrying means for carrying the sample one by one, a load lock chamber, a chamber for processing the sample under vacuum, and a second sample carrying means for carrying the sample under vacuum. The cassette table is disposed in the atmosphere at the front section of the vacuum processing unit, the first sample carrying means is arranged to carry the sample one by one between a plurality of cassettes disposed side by side at the front section and the load lock chamber, and the vacuum processing unit has a function for evaluating or inspecting the sample processed in the vacuum processing chamber.
申请公布号 JP2003086650(A) 申请公布日期 2003.03.20
申请号 JP20020204520 申请日期 2002.07.12
申请人 HITACHI LTD 发明人 SORAOKA MINORU;YOSHIOKA TAKESHI;KAWASAKI YOSHINAO
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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