FILM EVALUATING METHOD, TEMPERATURE MEASURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

A reference infrared absorption spectrum pattern is created as a database in advance. The infrared absorption pattern of a film to be measured is measured by the FT-IR method. Multivariate analysis by the PLS method is conducted referring to the reference infrared absorption spectrum pattern and the infrared spectrum pattern of the film to be measured, and the film-forming temperature and so forth are calculated on the basis of the results of the analysis.