MEMBER FOR PLASMA ETCHING APPARATUS

摘要

PURPOSE: To provide a member for a plasma etching apparatus which has high etching resistance due to plasma and which can be used for a long time without the generation of abnormal etchings. CONSTITUTION: The member for the plasma etching apparatus comprises a surface covered with a film made of fluororesin or engineering plastic and having a thickness of 50 μm or more and a surface roughness Ra of 1 μm or less.