DRESSING TOOL, DRESSING DEVICE, DRESSING METHOD, PROCESSING DEVICE, AND SEMICONDUCTOR DEVICE PRODUCING METHOD

摘要

A dressing device DA is comprised of a pad holding mechanism 10 for holding and rotating a grinding pad 15 having a doughnut disk-shaped pad surface 15a, a dressing tool 2 having a substantially rectangular dressing surface 3, and a dressing tool holding mechanism 1 for holding the dressing tool 2 with the dressing surface 3 opposed to the pad surface 15a of the grinding pad 15 held and rotated by the pad holding mechanism 10. The dressing tool holding mechanism 1 abuts dressing tool 2 held therein against the pad surface 15a to effect dressing with the widthwise centerline L1 of the dressing surface 3 directed to extend radially of the pad surface 15a. This makes it possible to improve the flatness of the processed surface after dressing.