发明名称 |
LITHOGRAPHY APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED BY THE SAME METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a bellows for a lithography device which can separate torsional vibrations, force or moments. SOLUTION: The bellows for use in connecting two airtight regions of the lithography device or connecting a region and a pump has a first region having a smooth spiral undulation and a second region capable of absorbing movement in the vertical direction caused by the relative rotation of ends of the first region. The second region can be used as an mirror image of the first region, one of circumferential undulations or as a plurality of subregions. |
申请公布号 |
JP2003086504(A) |
申请公布日期 |
2003.03.20 |
申请号 |
JP20020235856 |
申请日期 |
2002.08.13 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
KEMPER NICOLAAS RUDOLF;JACOBS HERNES;BUIS EDWIN JOHAN |
分类号 |
H01L21/027;F16J3/04;F16L11/15;G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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