发明名称 LITHOGRAPHY APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED BY THE SAME METHOD
摘要 PROBLEM TO BE SOLVED: To provide a bellows for a lithography device which can separate torsional vibrations, force or moments. SOLUTION: The bellows for use in connecting two airtight regions of the lithography device or connecting a region and a pump has a first region having a smooth spiral undulation and a second region capable of absorbing movement in the vertical direction caused by the relative rotation of ends of the first region. The second region can be used as an mirror image of the first region, one of circumferential undulations or as a plurality of subregions.
申请公布号 JP2003086504(A) 申请公布日期 2003.03.20
申请号 JP20020235856 申请日期 2002.08.13
申请人 ASML NETHERLANDS BV 发明人 KEMPER NICOLAAS RUDOLF;JACOBS HERNES;BUIS EDWIN JOHAN
分类号 H01L21/027;F16J3/04;F16L11/15;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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