VACUUM PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To obtain high-quality products by restraining a rise in temperature in a film forming chamber and eliminating negative effects of heat on the quality of products and on components in the film-forming chamber. SOLUTION: A heater cover 35 for supporting a substrate K to be subjected to film forming is provided in the opposite position of a ladder electrode 33 placed in a film forming chamber. The heater cover 35 is provided with a substrate heater 36 on its back. The substrate heater 36 is composed of several bar-shape cartridge heaters 44 in for heating the substrate K via the heater cover 35 in the process of treating the substrate K. The heater cover 35 is also provided with a cooling mechanism 61 on its back. The cooling mechanism 61 is ringed with cooling tubes 62 each of which has a rectangular section and through which cooling medium is made to flow.