| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetic generator for a semiconductor manufacturing apparatus, the apparatus and a method for controlling magnetic field strength, by which optimal magnetic field strength distribution is obtained. SOLUTION: In the surrounding of the reaction container 2 of an etching apparatus, the magnetic generator 6 for generating magnetism so as to quicken forming of plasma is arranged. The magnetic generator 6 has four main electromagnetic coil parts 7 for forming nearly parallel magnetic fields to the upper surface of a supporting table in the reaction container 2 and four auxiliary electromagnetic coil parts 8 arranged nearly coaxially with the respective main electromagnetic coil parts 7 to form a magnetic field facing opposite to the magnetic field formed by the main electromagnetic coil parts 7. The auxiliary electromagnetic coil parts 8 have heights lower than those of the main electromagnetic coil parts 7 and arranged at a site, which is closer to the reaction container 2 than the main electromagnetic coil parts 7. When the magnetic generator 6 applies a current, in a direction opposite to the main electromagnetic coil parts 7, the magnetic fields of mutually inverse polarities are superposed. |
