GRAPHICS ENGINE FOR HIGH PRECISION LITHOGRAPHY

摘要

The invention relates to rendering high precision images with sub-pixel resolution and is applicable to production of reticles and large area masks, direct writing of patterns and inspection of reticles or other patterned work pieces. Aspect of the invention can apply to both SLM and scanning technologies. The invention includes a method to modulating a micro mirror array to create and intensity image. The application discloses overlap zones, use of guard zones, moving and resizing polygons, representing areas utilizing two levels of resolution, defining edges, orientation of edges and corners.