发明名称 SURFACE MODIFYING LAYERS FOR ORGANIC THIN FILM TRANSISTORS
摘要 Provided is an organic thin film transistor comprising a self-assembled monolayer interposed between a gate dielectric and an organic semiconductor layer. The monolayer is a product of a reaction between the gate dielectric and a precursor to the self-assembled monolayer. The monolayer precursor composition has the formula: X-Y-Zn, wherein X is H or CH3; Y is a linear or branched C5-C50 aliphatic or cyclic aliphatic connecting group, or C8-C50 group comprising an aromatic group and a C3-C44 aliphatic or cyclic aliphatic connecting group; Z is selected from from -PO3H2, -OPO3H2, benzotriazolyl (-C6H4N3), carbonyloxybenzotriazole (-OC(=O)C6H4N3), oxybenzotriazole (-O-C6H4N3), aminobenzotriazole (-NH-C6H4N3), -CONHOH, -COOH, -OH, -SH, -COSH, -COSeH, -C5H4N, -SeH, -SO3H, -NC, -SiCl(CH3)2, -SiCl2CH3, amino, and phosphinyl; and n is 1, 2, or 3 provided that n = 1 when Z is -SiCl(CH3)2 or -SiCl2CH3. Methods of making a thin film transistor and an integrated circuit comprising thin film transistors are also provided.
申请公布号 WO03023877(A2) 申请公布日期 2003.03.20
申请号 WO2002US27172 申请日期 2002.08.26
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 KELLEY, TOMMIE W.,;MUYRES, DAWN V.,;PELLERITE, MARK J.,;DUNBAR, TIMOTHY D.,;BOARDMAN, LARRY D.,;SMITH, TERRANCE P.,
分类号 H01L51/05;H01L21/316;H01L29/786;H01L51/00;H01L51/10;H01L51/30;H01L51/40 主分类号 H01L51/05
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