| 摘要 |
PURPOSE: Provided is a positive resist composition having excellent SEM(scanning electron microscopy) resistance and resolution, and further having improved defocus latitude. CONSTITUTION: The positive resist composition comprises (A) at least two of resins having at least one of monomer selected from (a1) butyrolactones, (a2) norbornane lactones, (a3) cyclohexane lactones, and (a4) adamantane lactones, which have a dissolution rate in an alkali developer increased by the action of an acid; and (B) a compound which generates an acid by irradiation with active light or radiation. The positive resist composition is characterized in that the mixture of the resins(A) comprises at least two kinds of the monomer units(a1)-(a4).
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