发明名称 RADIATION-SENSITIVE RESIN COMPOSITION FOR BARRIER PLATE FORMATION, BARRIER PLATE, AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suitable as a barrier plate material to be used in forming organic EL layer by coating process in producing organic EL display devices, or in forming ITO transparent electrodes in producing liquid crystal display devices, to provide a barrier plate formed from the resin composition, and an organic EL display device and a liquid crystal display device each equipped with the barrier plate. SOLUTION: This radiation-sensitive resin composition for barrier plate formation comprises (A) a copolymer of (a-1) hexafluoropropylene, (a-2) an unsaturated carboxylic acid and/or anhydride thereof and (a-3) another unsaturated compound other than the above components (a-1) and (a-2), (B) an acid- generating compound which generates an acid on being irradiated with radiation, (C) a crosslinkable compound and (D) an organofluorine compound other than the component (A). The 2nd objective barrier plate is formed from the above resin composition. The other objective organic EL display device and liquid crystal display device include the above barrier plates, respectively.
申请公布号 JP2003082042(A) 申请公布日期 2003.03.19
申请号 JP20010271609 申请日期 2001.09.07
申请人 JSR CORP 发明人 SHIRAKI SHINJI;SUZUKI MASAMUTSU;SASAKI HIROBUMI;NIWA KAZUAKI
分类号 C08F291/00;C08K5/3492;C09K3/00;G03F7/00;G03F7/004;G03F7/033;G03F7/038;G03F7/075;G09F9/30;G09F9/35;H01L27/32;H01L51/50;H05B33/12;H05B33/22 主分类号 C08F291/00
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