| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a hollow structure film by removing a surfactant from a structure film of an inorganic oxide with satisfactory environmental properties at a low cost by a simple method. SOLUTION: The method for producing a porous film has a stage where a film containing a surfactant and an inorganic oxide material is formed on a substrate, and a stage where the film is brought into contact with ozone water to remove the surfactant from the film. Preferably, the stage of forming the film and the stage of removing the surfactant are performed on the same substrate, and the substrate is the one which is not substantially decomposed by ozone.
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