| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposited film of uniform film thickness and uniform film quality on a base body by performing the uniform plasma treatment of the base body of a relatively large area at a high treatment speed by using the plasma generated by the high frequency power. SOLUTION: The plasma treatment device comprises a reaction vessel 10 which is partly formed of a conductive member 12 facing the inside, and decompressed to perform the plasma treatment on a cylindrical base body 3, a high frequency electrode 21 which is provided outside the reaction vessel 10 with the high frequency power fed thereto, and a cylindrical base body holding member 14 for holding the cylindrical base body 3 in which an upper end face 14a thereof is provided facing the conductive member 12 in the reaction vessel 10. The space between the upper end face 14a of the base body holding member 14 and an inner surface 12a of the conductive member 12 is set to be >=1 mm to <=30 mm. |
