发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR INSPECTING DEVICE AND SEMICONDUCTOR INSPECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a semiconductor inspecting device and a semiconductor inspecting device, capable of easily coping with an increase in number of electrodes for inspection, facilitating manufacture, and absorbing a large difference in height between the adjacent electrodes. SOLUTION: In the manufacturing method for the semiconductor inspecting device and the inspecting device, a bump is brought into contact with the electrode formed on the surface of the semiconductor device to perform electric inspection for the semiconductor device. A through hole 26 and a wiring layer 28 for transmitting an inspection signal are formed in a base board 22 pressed to the semiconductor device, and a conductive rubber member 32 is formed in the through hole 26. The bump 34 is formed in the conductive rubber member 32 to be projected from the lower layer side of the base board 22.
申请公布号 JP2003084039(A) 申请公布日期 2003.03.19
申请号 JP20010274136 申请日期 2001.09.10
申请人 SEIKO EPSON CORP 发明人 KOMIYAMA TADASHI
分类号 G01R31/26;G01R1/073;G01R31/28;H01L21/66;(IPC1-7):G01R31/28 主分类号 G01R31/26
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