| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating agent for making a fine resist pattern so that when a fine resist pattern is to be formed by heat shrinking a resist pattern formed from a photoresist, the resist pattern can be smoothly shrunk by the heat treatment and that the resist can be easily removed by washing with water after the heat treatment of the resist pattern and to provide a method for efficiently forming a fine resist patter by using the above agent. SOLUTION: The coating agent consists of an aqueous solution containing a copolymer of (A) vinylpyrrolidone and (B) at least one kind of monomer selected from water-soluble vinyl compounds except for the (A) component. The method for forming a fine resist pattern includes a process of forming a resist pattern on a substrate, a process of applying a water-soluble resin film on the whole or a part of the resist pattern, a process of heat treating the substrate to reduce the intervals in the pattern, and a process of removing the water-soluble resin film by washing with water. |
