发明名称 COSMETIC BASE AND COSMETIC COMPOUNDED THEREWITH
摘要 PROBLEM TO BE SOLVED: To provide a cosmetic base having high compatibility with LPG as well as high moisture resistance and good hair rinsing ability, and to provide a cosmetic compounded with the base. SOLUTION: This cosmetic base comprises a polymer which is obtained by polymerization of a monomer component comprising (A) 25-70 wt.% of a monomer of formula (I) (R<1> is H or CH3 ; R<2> is H, a 1-12C alkyl or C(CH3 )2 CH2 COCH3 ; and R<3> is H or a 1-12C alkyl), (B) 5-60 wt.% of a monomer of formula (II) (R<4> is a 3C or 5C alkylene), (C) 2-20 wt.% of a monomer of formula (III) (R<5> is H or CH3 ; R<6> is H or COOH; and R<7> is H, CH3 or CH2 COOH), (D) 3-40 wt.% of a monomer of formula (IV) (R<8> is H or CH3 , R<9> is a 1-4C alkylene; R<10> and R<11> are each H or a 1-8C alkyl; and A is O or NH) and (E) 2-30 wt.% of a monomer of formula (V) (R<12> and R<15> are each H or CH3 ; R<13> and R<14> are each a 2-4C alkylene; and m and n are each 0-50, except that m and n are both 0). The other objective cosmetic compounded with the above base is provided.
申请公布号 JP2003081739(A) 申请公布日期 2003.03.19
申请号 JP20010269197 申请日期 2001.09.05
申请人 OSAKA ORGANIC CHEM IND LTD 发明人 MUKOYAMA TAKAHIRO
分类号 A61K8/72;A61K8/00;A61K8/02;A61Q5/06;C08F220/06;C08F220/34;C08F220/54;C08F222/02;C08F226/02;C08F290/06;(IPC1-7):A61K7/00;A61K7/11 主分类号 A61K8/72
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