| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a large ITO (indium-tin oxide) sintered compact which is useful as a target for sputtering for producing a transparent electrically conductive film in a short time. SOLUTION: A mixture of a compound containing indium and oxygen and a compound containing tin and oxygen, or a compound containing indium, tin and oxygen is used as the raw material, and, a d.c. pulse current is supplied thereto under pressure, and the raw material is electrically sintered. |
