发明名称 VISUAL INSPECTION APPARATUS USING ELECTRON BEAM
摘要 <p>PROBLEM TO BE SOLVED: To provide a visual inspection apparatus using an electron beam by which a defect hardly detectable by an optical image is detected with high accuracy by using an electron beam image, and by which a dose amount and an inspection speed as an inspection-apparatus single body as becoming a problem at this time can be controlled by a simple operation and with high accuracy. SOLUTION: In the inspection apparatus, the defect in a sample is detected on the basis of a detection signal of secondary charged particles generated by scanning the electron beam. The apparatus comprises a means which decides the inspection speed and a primary electron dose. The apparatus is provided with a function by which, when one from among both is decided, the other is automatically adjusted according to its result.</p>
申请公布号 JP2003083917(A) 申请公布日期 2003.03.19
申请号 JP20010277418 申请日期 2001.09.13
申请人 HITACHI LTD 发明人 GUNJI YASUHIRO;NINOMIYA HIROSHI;FUNATSU RYUICHI;KAMETANI MASATSUGU;YAMAMOTO KENJIRO
分类号 G01N23/225;G01R31/02;G01R31/302;H01J37/147;H01J37/28;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01N23/225
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