MEASURING DEVICE AND MEASURING METHOD FOR RETICULE PATTERN POSITION ACCURACY

摘要

PROBLEM TO BE SOLVED: To accurately measure position accuracy of an optional part where high position accuracy is requested in a device pattern of a reticule. SOLUTION: By matching a position of an edge part P11 where the high position accuracy is requested in the device pattern 12 and the position of a pattern center CP1 of a position accuracy measurement pattern 13 on the same straight line corresponding to a direction requesting the high position accuracy and arranging the position accuracy measurement pattern 13, on the basis of the pattern center of the position accuracy measurement pattern 13 and a difference between an observation value and a design value in a pattern dimension, the position accuracy (shift amount of the observation value and the design value) of the edge part P11 of the device pattern 12 is calculated.