LITHOGRAPHIC PROJECTION APPARATUS

摘要

PURPOSE: Provided is a lithographic projection apparatus which is capable of reducing vibrational movement of the projection lens causing fading of feature projected on a target site on a substrate. CONSTITUTION: The lithographic projection apparatus configured to image a pattern onto a substrate includes a radiation system configured to provide a projection beam of radiation; a support structure configured to support a patterning structure capable of patterning the projection beam according to a desired pattern; a substrate table configured to hold the substrate; a projection system mounted on a main plate and configured to project the patterned beam onto a target portion of the substrate; and a control system including: a movement detector configured to detect movement of the projection system and to generate a movement signal based on the detected movement; a controller configured to generate a control signal in response to the movement signal; and an actuator assembly configured to affect, in response to the control signal, the movement of the projection system.