| 摘要 |
A projection exposure device, in particular for micro-lithography, serves to produce an image of an object in an image plane positioned in an object plane. This happens with the aid of a light source emitting projection light and illumination optics positioned in the ray path between the light source and the object plane. In addition projection optics positioned in the ray path between the object plane and the image plane serve to guide the projection light. A filter (7) is positioned in a filter plane which lies in the vicinity of a pupil plane between the light source and the object plane. This has a moveable filter element (22') which has at least in certain areas (24) for the projection light a transmission factor which is greater than zero and less than 100%. The moveable filter element (22') is moveable in the filter plane and has a distribution of the transmission factor over the filter face, in such a way that the intensity distribution of the projection light perpendicular to the optical axis (14) in the ray path after the filter (7) changes with the movement of the filter element (22'). With such a filter (7) an illumination angle distribution can be adapted to a pre-set value (FIG. 5).
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