发明名称 Semiconductor device, semiconductor element and method for producing same
摘要 A semiconductor device comprises: a semiconductor substrate; a plurality of first diffusion layers having a low impurity density, the first diffusion layers being formed on the surface of the semiconductor substrate; a plurality of second diffusion layers having a high impurity density, the second diffusion layers being formed on the surface of the semiconductor substrate; a plurality of first contacts, each of which contacts the first diffusion layers and each of which is formed of a semiconductor; and a plurality of second contacts, each of which contacts the second diffusion layers and each of which is formed of a metal.
申请公布号 US6534867(B1) 申请公布日期 2003.03.18
申请号 US20000670990 申请日期 2000.09.26
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KAMIYA EIJI;YAEGASHI TOSHITAKE;SHIMIZU KAZUHIRO;SHIROTA RIICHIRO;TAKEUCHI YUJI;ARAI NORIHISA
分类号 H01L21/60;H01L21/768;H01L21/77;H01L21/8234;H01L21/8247;H01L21/84;H01L27/105;H01L27/115;H01L27/12;(IPC1-7):H01L23/48 主分类号 H01L21/60
代理机构 代理人
主权项
地址