发明名称 |
Method and apparatus for reducing IC die mass and thickness while improving strength characteristics |
摘要 |
A method for decreasing the mass and increasing the strength of an IC wafer assembly involves adding a polymer coating to the frontside of the wafer assembly to protect and strengthen the assembly, and removing silicon material from the backside of the wafer assembly, reducing the overall thickness of the assembly. The removal can be by backgrinding or by many other removal techniques, and in some cases is removed to a thickness less than that of the polymer coating.
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申请公布号 |
US6534419(B1) |
申请公布日期 |
2003.03.18 |
申请号 |
US20000660725 |
申请日期 |
2000.09.13 |
申请人 |
ADVANCED INTERCONNECT SOLUTIONS |
发明人 |
ONG EE CHANG |
分类号 |
H01L21/48;H01L21/60;H01L23/00;H01L23/31;H01L23/485;H01L23/498;H01R12/00;H05K3/34;(IPC1-7):H07L21/31 |
主分类号 |
H01L21/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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