发明名称 Method and apparatus for reducing IC die mass and thickness while improving strength characteristics
摘要 A method for decreasing the mass and increasing the strength of an IC wafer assembly involves adding a polymer coating to the frontside of the wafer assembly to protect and strengthen the assembly, and removing silicon material from the backside of the wafer assembly, reducing the overall thickness of the assembly. The removal can be by backgrinding or by many other removal techniques, and in some cases is removed to a thickness less than that of the polymer coating.
申请公布号 US6534419(B1) 申请公布日期 2003.03.18
申请号 US20000660725 申请日期 2000.09.13
申请人 ADVANCED INTERCONNECT SOLUTIONS 发明人 ONG EE CHANG
分类号 H01L21/48;H01L21/60;H01L23/00;H01L23/31;H01L23/485;H01L23/498;H01R12/00;H05K3/34;(IPC1-7):H07L21/31 主分类号 H01L21/48
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