发明名称 |
Resist compositions with polymers having pendant groups containing plural acid labile moieties |
摘要 |
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a monomer with a pendant group containing plural acid labile moieties. Preferred pendant groups containing plural acid labile moieties are characterized by the presence of a bulky end group.
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申请公布号 |
US6534239(B2) |
申请公布日期 |
2003.03.18 |
申请号 |
US20010844848 |
申请日期 |
2001.04.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
VARANASI PUSHKARA RAO;LAWSON MARGARET C.;LI WENJIE |
分类号 |
G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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