发明名称 Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
摘要 A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a carbonitride containing surface and process for manufacture thereof.
申请公布号 US6533910(B2) 申请公布日期 2003.03.18
申请号 US20000750251 申请日期 2000.12.29
申请人 LAM RESEARCH CORPORATION 发明人 O'DONNELL ROBERT J.;DAUGHERTY JOHN E.;CHANG CHRISTOPHER C.
分类号 H01L21/3065;B01J19/02;C23C16/44;H01J37/32;(IPC1-7):C23C14/34;C23F1/00 主分类号 H01L21/3065
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