发明名称 |
Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
摘要 |
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a carbonitride containing surface and process for manufacture thereof.
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申请公布号 |
US6533910(B2) |
申请公布日期 |
2003.03.18 |
申请号 |
US20000750251 |
申请日期 |
2000.12.29 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
O'DONNELL ROBERT J.;DAUGHERTY JOHN E.;CHANG CHRISTOPHER C. |
分类号 |
H01L21/3065;B01J19/02;C23C16/44;H01J37/32;(IPC1-7):C23C14/34;C23F1/00 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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