发明名称
摘要 PURPOSE: A quantitative automatic mixing equipment of etching solution is provided, which can automatically feed etching solution according to the sensed result of a multi-contact sensor when etching solution is decreased by staining paper or evaporating and also can precisely control etching solution by simple operation of a selector. CONSTITUTION: The system comprises the followings: (i) an etching solution tank (120) for keeping concentrated etching solution; (ii) a measuring tank (140) that has a multi-contact sensor (144) for supplying etching solution quantitatively and a selector (142) for selecting concentration of etching solution; (iii) a damping water tank (160) for keeping damping water that is a mixture of etching solution and water; and (iv) an automatic mixing device for mixing etching solution automatically.
申请公布号 KR100375839(B1) 申请公布日期 2003.03.15
申请号 KR20000005431 申请日期 2000.02.03
申请人 发明人
分类号 B41F7/32;B01F3/08;B01F15/00;B01F15/04 主分类号 B41F7/32
代理机构 代理人
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