发明名称 UPPER ELECTRODE LIFT APPARATUS FOR SEMICONDUCTOR ETCHING APPARATUS
摘要 PURPOSE: An upper electrode lift apparatus for a semiconductor etching apparatus is provided to improve quality and yield of a semiconductor device by minimizing an abrasion phenomenon occurring in driving a motor. CONSTITUTION: The motor(152) is provided which supplies driving force. A motor axis(154) has a cutting surface, installed in the motor. A sprocket(156) vertically transfers the vertical axis of the upper electrode(120) according as the motor revolves or counter-revolves, having a coupling hole inserted into the motor axis. The coupling hole of the sprocket has a cutting surface corresponding to the cutting surface of the motor axis.
申请公布号 KR20030021650(A) 申请公布日期 2003.03.15
申请号 KR20010055015 申请日期 2001.09.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, YUNG SAM
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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