发明名称 |
UPPER ELECTRODE LIFT APPARATUS FOR SEMICONDUCTOR ETCHING APPARATUS |
摘要 |
PURPOSE: An upper electrode lift apparatus for a semiconductor etching apparatus is provided to improve quality and yield of a semiconductor device by minimizing an abrasion phenomenon occurring in driving a motor. CONSTITUTION: The motor(152) is provided which supplies driving force. A motor axis(154) has a cutting surface, installed in the motor. A sprocket(156) vertically transfers the vertical axis of the upper electrode(120) according as the motor revolves or counter-revolves, having a coupling hole inserted into the motor axis. The coupling hole of the sprocket has a cutting surface corresponding to the cutting surface of the motor axis.
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申请公布号 |
KR20030021650(A) |
申请公布日期 |
2003.03.15 |
申请号 |
KR20010055015 |
申请日期 |
2001.09.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, YUNG SAM |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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