METHOD FOR MONITORING AND CONTROLLING SEMICONDUCTOR FABRICATING APPARATUS AND EXECUTING APPARATUS THEREOF

摘要

PURPOSE: A semiconductor processing apparatus is provided to improve an operating ratio and reliability by monitoring a process state and by detecting an abnormal process state or estimating a process result based upon a monitor output. CONSTITUTION: A sensor(3) monitors the process state of the semiconductor processing apparatus that processes a semiconductor wafer. A process result input unit(5) inputs a measurement value of the process result of the semiconductor wafer processed by the semiconductor processing apparatus. A model formula generating unit(7) uses sensor data obtained by the sensor as an explanation variable based upon the sensor data and the measurement value and generates a model formula that estimates the process result. A process result estimating unit estimates the process result based upon the model formula and the sensor data. A process condition control unit(10) compares the estimated process result with a predetermined set value and controls a process condition of the semiconductor processing apparatus to correct the comparison result.