发明名称 |
SEMICONDUCTOR DEVICE, CAPACITIVE ELEMENT AND MANUFACTURING METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To solve a problem that reduction of leak current cannot be obtained even if platinum of large work function is adopted for an electrode material, since a microscopically sharp part occurs at the end face of a lower platinum electrode when a recessed electrode represented by a cone cave capacitor is formed. SOLUTION: The microscopically sharp part caused in the end face of the lower platinum electrode (Pt film 7) is rounded by annealing. Thus, a high performance capacitor with reduced leak current can be formed. |
申请公布号 |
JP2003078030(A) |
申请公布日期 |
2003.03.14 |
申请号 |
JP20010264056 |
申请日期 |
2001.08.31 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KOTANI AKIHIKO;NAGAI TOSHIHIKO |
分类号 |
H01L27/04;H01L21/822;H01L21/8242;H01L27/108 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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