HEATING APPARATUS OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a heating apparatus of a substrate that can uniformly heat the substrate at a high temperature. SOLUTION: A first planar section 3 that opposes one surface in a substrate 1 with an interval, and a side section 4 that surrounds the circumference section of the substrate 1 with an interval area set to be mirror surfaces 7. A heating vessel 2 is formed so as to accommodate the substrate 1 inside with a second planar section 5 that opposes the other surface of the substrate 1 at an interval as a transparent plate 5a having infrared transmission properties. A heater 8 is provided outside the transparent plate 5a of the heating vessel 2.