发明名称 PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive thermosetting resin composition excellent in heat resistance, chemical plating resistance, resolving power, etc., as a soldering resist. SOLUTION: The photosensitive thermosetting resin composition comprises (A) a photopolymerizable prepolymer (formula I) obtained by reacting an epoxy resin (A1) having two or more epoxy groups with a monocarboxylic acid (A2) having one vinyl group and further with a saturated or unsaturated polyvalent acid anhydride (A3), (B) a diluent selected from single or combined diluents of photopolymerizable vinyl monomers (B1) and/or organic solvents (B2), (C) a photopolymerization initiator, (D) an epoxy resin including a dissolvable crystalline epoxy resin (D1) which has two epoxy groups in one molecular unit and does not dissolve in the used diluent at room temperature but dissolves in the diluent at a temperature of 60-80 deg.C and/or an epoxy resin (D2) which has at least two epoxy groups in one molecular unit and dissolves in the used diluent at room temperature and (E) an inorganic filler.
申请公布号 JP2003076009(A) 申请公布日期 2003.03.14
申请号 JP20010255646 申请日期 2001.08.27
申请人 NAN YA PLAST CORP 发明人 SU MEIJIN
分类号 G03F7/027;C08F290/06;C08G59/17;C08G59/20;H05K3/28 主分类号 G03F7/027
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