ELECTRON BEAM SYSTEM AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a projection type electron beam system with which the moving direction of the stage and the integrated direction of the arrangement of TDI-CCD acceptance surface are matched with high degree of accuracy. SOLUTION: A sample 11 set on a stage 21 is irradiated with a plurality of primary electron beams emitted from an electron gun 1. With this set-up, secondary electrons are emitted from the sample, received by micro channel plate (MCP) 16 and are changed into an electrical signal within a TDI-CCD 19 via a scintillator 17 and a relay optical system 18. The electron beams going to MCP 16 are properly rotated by adjusting intensity of magnetic field from a magnetic lens 15, by which the moving direction of the stage and the integrated direction of the arrangement of the TDI-CCD acceptance surface are matched. The electric signal generated by the TDI-CCD is displayed after treatment in an image display section 20.