| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve the problem that impurities are stuck and deposited in a gas circulation mechanism while exhaust gas is circulated, that a deposit in the gas circulation mechanism is peeled off by a circulation flow and that it becomes the cause of a particle since an auxiliary product due to etching is included in exhaust gas as the impurity even though the exhaust volume and the use volume of processing gas can be reduced when a part of exhaust gas is circulated through the gas circulation mechanism. SOLUTION: In a processor 10, processing gas is supplied into a processing chamber 11 from the first gas supply hole 133 of a shower head 13 through a gas supply mechanism 15, processed gas is evacuated from within the processing chamber 11 through the gas evacuating mechanism 14 and a part of the evacuated gas is returned into the processing chamber 11 from the second gas supply hole 135 of the shower head 13 through the gas circulation mechanism 21. Heating means 25 are installed in the gas exhaust mechanism 14 and the gas circulation mechanism 21.</p> |
