发明名称 BURIED SEMICONDUCTOR OPTICAL DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a buried semiconductor optical device having a structure where Zn is restrained from being diffused into an active layer and a Fe-doped InP buried layer. SOLUTION: A laminate which is composed of at least a first conductivity- type clad layer 2, an active region formed of an active layer or a light absorbing layer 4, and a second conductivity-type clad layer 6, is processed into a mesa stripe on a semiconductor substrate 1. Each side of the laminate is filled up with An Fe-doped InP layer 10 for the formation of a buried semiconductor optical device, and the buried semiconductor optical device is characterized by it that a layer 9 loaded with ruthenium is provided between the Fe-doped InP layer 10 and the laminate.</p>
申请公布号 JP2003078212(A) 申请公布日期 2003.03.14
申请号 JP20010269934 申请日期 2001.09.06
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 OGASAWARA MATSUYUKI;IGA RYUZO;KONDO YASUHIRO;KONDO SUSUMU
分类号 H01S5/227;(IPC1-7):H01S5/227 主分类号 H01S5/227
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