| 摘要 |
PROBLEM TO BE SOLVED: To stably perform a processing as being set to a substrate to be processed even when reproducibility of the processing of a semiconductor device manufacturing device is instable. SOLUTION: A manufacturing method for a semiconductor device comprises a step S101 of deciding a film formation recipe for applying a prescribed processing to the substrate to be processed inside a reaction chamber of the semiconductor device manufacturing device, a step S102 of performing the processing to the substrate to be processed on the basis of the decided film formation recipe, a step S103 of measuring one or more process parameters fluctuating throughput of the processing to the substrate to be processed during the processing, steps S104 and S105 of obtaining a new film formation recipe in which a processing amount becomes a set value during the processing from a reference state indicating relation of the throughput corresponding to a processing condition and the process parameter and a measured value of the process parameter measured during the processing, and a step S105 of performing the processing on the basis of the new film formation recipe during the processing.
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